TSMC continues to assess when to adopt ASML’s most advanced lithography equipment, High-NA EUV (high numerical aperture, extreme ultraviolet) due to its expensive, US$400 million price tag, Reuters reports, but it won’t be at A14 (1.4nm) because “our technology team continues to find a way to extend the life of current (Low-NA EUV machines) by harvesting the scaling benefit,” said TSMC SVP Kevin Zhang. $Taiwan Semiconductor(TSM.US) $ASML(ASML.US) $Intel(INTC.US) #semiconductors
Source: Dan Nystedt
The copyright of this article belongs to the original author/organization.
The views expressed herein are solely those of the author and do not reflect the stance of the platform. The content is intended for investment reference purposes only and shall not be considered as investment advice. Please contact us if you have any questions or suggestions regarding the content services provided by the platform.
